Ultrahoge vacuümsputter-ionenpompolie minder 7×10-8 Pa ultieme druk
Ion Pump , 2L-25 , DN35CF , 22L/s Air , 0.3L/s Ar , +7KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of
Varian-ionenpomp met hoog vacuüm Handige bediening 420L/S Lucht 85L/S Ar
Ion Pump , 3L-400C , DN150CF , 420L/s Air , 85L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: This series of pump has advantages such as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can
Professionele 7KV Starcell-ionpomp 2L-200B voor elektrisch vacuümapparaat
Ion Pump , 2L-200B , DN150CF , 230L/s Air , ultimate pressure 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can be applied to
-5KV Triode sputterpomp Ion roestvrij staal Verhoogde pompsnelheid van inert gas
Ion Pump , 3L-25 , DN35CF , 21L/s Air , 6L/s Ar , -5KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of
Olie minder dan -5KV Ion vacuümpomp 55L/S Lucht 12L/S Ar Hoog vacuüm
Ion Pump , 3L-50 , DN100CF , 55L/s Air , 12L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of magnetic
KYKY Ion Vacuum Pump DN150CF Flange 7E-8 Pa Ultieme druk CE goedgekeurd
Ion Pump , 3L-100 , DN150CF , 110L/s Air , 24L/s Ar , -5KV , 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint
+7KV Ion vacuümpomp Nul trillingen 65L/S Lucht 0,6L/S Ar Pompsnelheid
Ion Pump , 2L-50 , DN100CF , 65L/s Air , 0.6L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. High vacuum degree 2. Zero vibration 3. Zero noise 4. Cleanness 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled
120L/S Air 1.2L/S Ar Ion vacuümpomp Nul geluid voor hoogenergetische deeltjesversneller
Ion Pump , 2L-100 , DN150CF , 120L/s Air , 1.2L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum, with such advantages as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process
Industrie +7KV Ion vacuümpomp 220L/S Air 2.4L/S Ar Werkt in gesloten systeem
Ion Pump , 2L-200C , DN150CF , 220L/s Air , 2.4L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled
+5KV Ion Getter Pump 450L/S Lucht 4.5L/S Ar DN150CF Flanke Gemakkelijke werking
Ion Pump , 2L-400C , DN150CF , 450L/s Air , +5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: It can be applied to scientific experiment apparatuses such
High Resolution Scanning Electron Microscope / Sem Instrumentation Stable Beam Current
KYKY-EM8100 high-resolution field emission scanning electron microscope with new electron optical designs such as lens barrel acceleration technology and low-aberration conical objective lens. It achieves sub-nanometer imaging at low voltage, has broad applicability to various materials, and can meet the testing needs of various scientific research and industrial fields. As KYKY over 60 years SEM manufacture experience, the whole EM series supports old system refurbished and
