초고 진공 스프터 이온 펌프 오일 7×10-8 Pa 이하 최종 압력
Ion Pump , 2L-25 , DN35CF , 22L/s Air , 0.3L/s Ar , +7KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of
고 진공 변수 이온 펌프 편리한 작동 420L/S 공기 85L/S Ar
Ion Pump , 3L-400C , DN150CF , 420L/s Air , 85L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: This series of pump has advantages such as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can
전기 진공 장치용 전문 7KV 스타 셀 이온 펌프 2L-200B
Ion Pump , 2L-200B , DN150CF , 230L/s Air , ultimate pressure 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can be applied to
-5KV 트라이오드 스푸터 펌프 이온 스테인리스 스틸 무활성 가스 펌프 비율을 증가
Ion Pump , 3L-25 , DN35CF , 21L/s Air , 6L/s Ar , -5KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of
오일 미만 -5KV 이온 진공 펌프 55L/S 공기 12L/S Ar 높은 진공
Ion Pump , 3L-50 , DN100CF , 55L/s Air , 12L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of magnetic
KYKY 이온 진공 펌프 DN150CF 플랜지 7E-8 Pa 최종 압력 CE 승인
Ion Pump , 3L-100 , DN150CF , 110L/s Air , 24L/s Ar , -5KV , 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint
+7KV 이온 진공 펌프 진동 65L/S 공기 0.6L/S Ar 펌프 속도
Ion Pump , 2L-50 , DN100CF , 65L/s Air , 0.6L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. High vacuum degree 2. Zero vibration 3. Zero noise 4. Cleanness 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled
고에너지 입자 가속기를 위한 120L/S 공기 1.2L/S Ar 이온 진공 펌프 0 소음
Ion Pump , 2L-100 , DN150CF , 120L/s Air , 1.2L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum, with such advantages as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process
산업 +7KV 이온 진공 펌프 220L/S 공기 2.4L/S Ar 폐쇄 시스템
Ion Pump , 2L-200C , DN150CF , 220L/s Air , 2.4L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled
+5KV 이온 가터 펌프 450L/S 공기 4.5L/S Ar DN150CF 플랜지 편리한 작동
Ion Pump , 2L-400C , DN150CF , 450L/s Air , +5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: It can be applied to scientific experiment apparatuses such
고해상도 스캔 전자 현미경 / Sem 기기 안정 빔 전류
KYKY-EM8100 high-resolution field emission scanning electron microscope with new electron optical designs such as lens barrel acceleration technology and low-aberration conical objective lens. It achieves sub-nanometer imaging at low voltage, has broad applicability to various materials, and can meet the testing needs of various scientific research and industrial fields. As KYKY over 60 years SEM manufacture experience, the whole EM series supports old system refurbished and
