Υψηλής κενότητας έλαιο αντλίας ιόντων με ψεκαστήρα λιγότερο από 7×10-8 Pa Τελική πίεση
Ion Pump , 2L-25 , DN35CF , 22L/s Air , 0.3L/s Ar , +7KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of
Αντλία ιόντων υψηλού κενού Εύκολη λειτουργία 420L/S Αέρα 85L/S Ar
Ion Pump , 3L-400C , DN150CF , 420L/s Air , 85L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: This series of pump has advantages such as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can
Επαγγελματική αντλία ιόντων 7KV Starcell 2L-200B για ηλεκτρική συσκευή κενού
Ion Pump , 2L-200B , DN150CF , 230L/s Air , ultimate pressure 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can be applied to
-5KV Triode Sputter αντλία ιόντων από ανοξείδωτο χάλυβα αυξάνοντας το ποσοστό άντλησης αδρανών αερίων
Ion Pump , 3L-25 , DN35CF , 21L/s Air , 6L/s Ar , -5KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of
Πετρέλαιο λιγότερο από -5KV αντλία κενού ιόντων 55L/S αέρα 12L/S Ar υψηλό βαθμό κενού
Ion Pump , 3L-50 , DN100CF , 55L/s Air , 12L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of magnetic
Πυροβόλησα αντλία ιόντων KYKY DN150CF Φλάντζη 7E-8 Pa Τελική πίεση Έγκριση CE
Ion Pump , 3L-100 , DN150CF , 110L/s Air , 24L/s Ar , -5KV , 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint
+7KV Ion Pump Vacuum Zero Vibration 65L/S Air 0,6L/S Ar Pumping Speed
Ion Pump , 2L-50 , DN100CF , 65L/s Air , 0.6L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. High vacuum degree 2. Zero vibration 3. Zero noise 4. Cleanness 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled
120L/S Αέρα 1.2L/S Ar Ιοντική αντλία κενού Μηδενικός θόρυβος για επιταχυντή σωματιδίων υψηλής ενέργειας
Ion Pump , 2L-100 , DN150CF , 120L/s Air , 1.2L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum, with such advantages as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process
Βιομηχανία +7KV αντλία κενού ιόντων 220L/S αέρα 2.4L/S Ar λειτουργεί σε κλειστό σύστημα
Ion Pump , 2L-200C , DN150CF , 220L/s Air , 2.4L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled
+5KV αντλία ιόντων 450L/S αέρα 4.5L/S Ar DN150CF Φλάντζη Εύκολη λειτουργία
Ion Pump , 2L-400C , DN150CF , 450L/s Air , +5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: It can be applied to scientific experiment apparatuses such
Μεγάλη ανάλυση ηλεκτρονικό μικροσκόπιο σάρωσης / Sem οργάνωση Σταθερό ρεύμα δέσμης
KYKY-EM8100 high-resolution field emission scanning electron microscope with new electron optical designs such as lens barrel acceleration technology and low-aberration conical objective lens. It achieves sub-nanometer imaging at low voltage, has broad applicability to various materials, and can meet the testing needs of various scientific research and industrial fields. As KYKY over 60 years SEM manufacture experience, the whole EM series supports old system refurbished and
