ultra high vacuum ion pump

Ion Pump , 2L-25 , DN35CF , 22L/s Air , 0.3L/s Ar , +7KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of

Ion Pump , 3L-50 , DN100CF , 55L/s Air , 12L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of magnetic

Ion Pump , 3L-400C , DN150CF , 420L/s Air , 85L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: This series of pump has advantages such as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can

Ion Pump , 2L-200B , DN150CF , 230L/s Air , ultimate pressure 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can be applied to

Ion Pump , 2L-100 , DN150CF , 120L/s Air , 1.2L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum, with such advantages as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process

Ion Pump , 3L-25 , DN35CF , 21L/s Air , 6L/s Ar , -5KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of

Ion Pump , 2L-50 , DN100CF , 65L/s Air , 0.6L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. High vacuum degree 2. Zero vibration 3. Zero noise 4. Cleanness 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled

Ion Pump , 3L-100 , DN150CF , 110L/s Air , 24L/s Ar , -5KV , 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint

Ion Pump , 2L-400C , DN150CF , 450L/s Air , +5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: It can be applied to scientific experiment apparatuses such

Ion Pump , 2L-200C , DN150CF , 220L/s Air , 2.4L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled