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αποτελέσματα για "

ultra high vacuum ion pump

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Υψηλής κενότητας έλαιο αντλίας ιόντων με ψεκαστήρα λιγότερο από 7×10-8 Pa Τελική πίεση

Ion Pump , 2L-25 , DN35CF , 22L/s Air , 0.3L/s Ar , +7KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of

Πετρέλαιο λιγότερο από -5KV αντλία κενού ιόντων 55L/S αέρα 12L/S Ar υψηλό βαθμό κενού

Ion Pump , 3L-50 , DN100CF , 55L/s Air , 12L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of magnetic

Αντλία ιόντων υψηλού κενού Εύκολη λειτουργία 420L/S Αέρα 85L/S Ar

Ion Pump , 3L-400C , DN150CF , 420L/s Air , 85L/s Ar , -5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: This series of pump has advantages such as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can

Επαγγελματική αντλία ιόντων 7KV Starcell 2L-200B για ηλεκτρική συσκευή κενού

Ion Pump , 2L-200B , DN150CF , 230L/s Air , ultimate pressure 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenience in operation. Applications: The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can be applied to

120L/S Αέρα 1.2L/S Ar Ιοντική αντλία κενού Μηδενικός θόρυβος για επιταχυντή σωματιδίων υψηλής ενέργειας

Ion Pump , 2L-100 , DN150CF , 120L/s Air , 1.2L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum, with such advantages as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process

-5KV Triode Sputter αντλία ιόντων από ανοξείδωτο χάλυβα αυξάνοντας το ποσοστό άντλησης αδρανών αερίων

Ion Pump , 3L-25 , DN35CF , 21L/s Air , 6L/s Ar , -5KV , 7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of

+7KV Ion Pump Vacuum Zero Vibration 65L/S Air 0,6L/S Ar Pumping Speed

Ion Pump , 2L-50 , DN100CF , 65L/s Air , 0.6L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. High vacuum degree 2. Zero vibration 3. Zero noise 4. Cleanness 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled

Πυροβόλησα αντλία ιόντων KYKY DN150CF Φλάντζη 7E-8 Pa Τελική πίεση Έγκριση CE

Ion Pump , 3L-100 , DN150CF , 110L/s Air , 24L/s Ar , -5KV , 2.7E-8Pa Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Principle: Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint

+5KV αντλία ιόντων 450L/S αέρα 4.5L/S Ar DN150CF Φλάντζη Εύκολη λειτουργία

Ion Pump , 2L-400C , DN150CF , 450L/s Air , +5KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: It can be applied to scientific experiment apparatuses such

Βιομηχανία +7KV αντλία κενού ιόντων 220L/S αέρα 2.4L/S Ar λειτουργεί σε κλειστό σύστημα

Ion Pump , 2L-200C , DN150CF , 220L/s Air , 2.4L/s Ar , +7KV Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump. Advantages: 1. Cleanness 2. High vacuum degree 3. Zero noise 4. Zero vibration 5. Convenient to operate Applications: 1. High-energy particle accelerator 2. Controlled